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Automatic Exposure Systems
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Hap 5020 Series
Large Panel Dry Film Laminator |
Hap5020 with FAN-HEPA option |
- Alignement Accuracy: 10µ
- Collimated Exposure
Collimated half angle ≤ 1.2°
Declination angle 1.0°
- Illumination uniformity: 90%
- Pattern Matching Alignement
- Touch Panel Controls
- TFT Color Monitors
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Other Hap5020 Models
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Hap5020SR - Solder Resists Exposure System
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- For handling and exposing delicate solder resist for high density, fine pattern appllications.
- Capable of exposing not on a liquid solder resist but also liquid pattern resist and photo via build up.
- High intensity models
- available with 8kW (HAP8020SR) and 10kW (HAP1010SR) short arc mercury lamp
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| Hap5020AS - Automatic Artwork Scaling Exposure System (patent pending) |
- Automatically modifies a photomask's size using an " Auto Scaling Function" (pantent pending), allowing for more consistent exposure despite potential panel expansion caused by other processes.
- Designed for build-up process exposure.
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| Hap5020PK - Package PWB Exposure System |
- Designed especially for tougher chip package PWB.
- Exposes a whole board at once.
- Edge transfer conveyor system and glass mask artwork fixture are standard features.
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| Hap5020PK-D3 // Hap5020PK-D6 - Partial Exposure System |
- Designed specifically for tougher chip package PWB.
- Divides a panel into multiple exposure areas, aligning and exposing each section independently.
- Uses a unique shutter system (patent pending) to divide a PWB into multiple sections.
- HAP5020PK-D3 : The whole board, 2, or 3 sections
- HAP5020PK-D6 : The whole board, 2, 3, 4, or 6 sections.
- A special Mask-Slide system (patent pending) minimizes dead space during partial exposure.
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